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MATERIALS SCIENCE AND TECHNOLOGY. SEMICONDUCTORS
ArticleName Magnetron deposition of titania layers with optical emission spectroscopy diagnostics of high frequency plasma
ArticleAuthor L. A. Balagurov, I. V. Kulermanov, A. F. Orlov, E. A. Petrova
ArticleAuthorData L. A. Balagurov, I. V. Kulermanov, A. F. Orlov, E. A. Petrova, OAO Giredmet
Abstract
Optical emission spectroscopy has been used to increase the reproducibility of titania layers magnetron deposition. The presence of a fiber−optical cable in the spectrometer Avantes allows recording spectra in the immediate proximity of the plasma area, and the silicon CCD 2048 element detector provides for simultaneous and almost instant recording of the entire spectrum with a good resolution over the 350—810 nm range. Plasma emission lines have been identified and used for the control of technological process. Emission intensity has been studied as a function of anode current. Titanium layers were prepared at high currents, following which the TiO layers with a metalic conductivity were deposited at a lower current and TiO2 with a conductivity of from 10−2 Ohm·cm at very low currents. As a result of RF magnetron deposition control by titanium emission intensity, the scatter in the resistivity of the titania layers grown under identical conditions decreased significantly.
keywords Titania, plasma, optical emission spectroscopy.
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